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    • 专利摘要:

    公开号:NL1036683A1
    申请号:NL1036683
    申请日:2009-03-10
    公开日:2009-10-15
    发明作者:Arnold Sinke；Johan Maria Van Boxmeer
    申请人:Asml Netherlands Bv；
    IPC主号:
    专利说明:

    Focus Sensor. Inspection Apparatus. Lithographic Apparatus and Control System CROSS-REFERENCE TO RELATED APPLICATIONS
    This application is the benefit of US provisional application 61 / 071,125, which was filed on April 14, 2008, and which is included in its entirety by reference.
    FIELD
    The present invention relates to methods of inspection usable, for example, in the manufacture of devices by lithographic techniques and to methods of manufacturing devices using lithographic techniques.
    BACKGROUND
    A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). In that instance, a patterning device, which is alternatively referred to as a mask or a reticle, may be used to generate a circuit pattern to be formed on an individual layer of the IC. This pattern can be transferred onto a target portion (e.g., including part of, one, or several dies) on a substrate (e.g., a silicon wafer). Transfer of the pattern is typically via imaging onto a layer of radiation-sensitive material (resist) provided on the substrate. In general, a single substrate will contain a network of adjacent target portions that are successively patterned. Known lithographic apparatus include so-called steppers, in which each target portion is irradiated by exposing an entire pattern onto the target portion at one time, and so-called scanners, in which each target portion is irradiated by scanning the pattern through a radiation beam in a given direction (the "scanning" direction) while synchronously scanning the substrate parallel or anti-parallel to this direction. It is also possible to transfer the pattern from the patterning device to the substrate by imprinting the pattern onto the substrate.
    In order to monitor the lithographic process, it is necessary to measure parameters of the patterned substrate, for example the overlay error between successive layers formed in or on it. There are various techniques for making measurements of the microscopic structures formed in lithographic processes, including the use of scanning electron microscopes and various specialized tools. One form of specialized inspection tool is a scatterometer in which a beam of radiation is directed onto a surface of the substrate and properties of the scattered or reflected beam are measured. By comparing the properties of the beam before and after it has been reflected or scattered by the substrate, the properties of the substrate can be determined.
    This can be done, for example, by comparing the reflected beam with data stored in a library or known measurements associated with known substrate properties. Two main types or scatterometer are known. Spectroscopic scatterometers directly a broadband radiation beam onto the substrate and measure the spectrum (intensity as a function of wavelength) or the radiation scattered into a particular narrow angular range. Angularly resolved scatterometers use a monochromatic radiation beam and measure the intensity of the scattered radiation as a function of angle.
    Confocal systems are often used in lithographic apparatus and scatterometers as part of the focus sensors. A confocal sensor generates a focus error signal which can be used as a part of a control loop to ensure that the substrate is in focus. Such a confocal sensor is depicted in Figure 5 of the accompanying Figures and an example of a typical aperture plate is depicted in Figure 6. As can be seen the aperture plate comprises a pinhole type aperture. The confocal sensor comprises detectors arranged behind the aperture plates. A confocal sensor as depicted in Figure 5 combined with the aperture plates of Figure 6 results in a focus signal (generated by subtracting the signal from one of the detectors from the signal from the other detector) as shown in Figure 7. In this Figure the dashed lines indicate the signals from each of the aperture and solid lines indicate the focus signal. As can be seen from this Figure, the focus range is limited. For example, when the focus error is large the signal is weak because the aperture plate blocks a large portion of the radiation.
    Although the size of the pinhole aperture could be increased the slope of the focus signal around the focal point would become shallower, so it would be more difficult to detect the focal point. A shallower slope thus results in a less sensitive focus sensor.
    SUMMARY
    It is desirable to provide a focus sensor in which the capture range is increased.
    [0007] According to an aspect of the invention, there is provided a focus sensor including a confocal sensor including a variety of plates, each plate including a central transmissive portion and an outer transmissive portion, the remainder or said plates being opaque.
    According to a further aspect of the invention there is provided an inspection apparatus configured to measure a property or a substrate, including the apparatus: an illumination system configured to condition a radiation beam; a radiation projector configured to project a radiation onto said substrate; a high numerical aperture lens; a detector configured to detect the radiation beam reflected from a surface of the substrate; and a focus sensor including a confocal sensor including a variety of plates, each plate including a central transmissive portion and an outer transmissive portion, the remainder of said plates being opaque.
    According to a further aspect of the invention there is provided a lithographic apparatus including an illumination optical system arranged to illuminate a pattern; a projection optical system arranged to project an image of the pattern on a substrate; and a focus sensor including a confocal sensor including a variety of plates, each plate including a central transmissive portion and an outer transmissive portion, the remainder of said plates being opaque.
    [00010] According to a further aspect of the invention there is provided a control system for controlling the position of a substrate, the system including: a focus sensor including a confocal sensor including a multiple of plates, each plate including a central transmissive portion and an outer transmissive portion, the remainder or said plates being an opaque controller for controlling the position of said substrate.
    LETTER DESCRIPTION OF THE DRAWINGS
    Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings in which corresponding reference symbols indicate corresponding parts, and in which:
    Figure 1 depicts a lithographic apparatus;
    Figure 2 depicts a lithographic cell or cluster;
    Figure 3 depicts a first scatterometer;
    Figure 4 depicts a second scatterometer;
    Figure 5 depicts a biconfocal sensor;
    Figure 6 depicts a conventional aperture plate;
    Figure 7 is a graph showing the focus signal for the biconfocal sensor and aperture plates of Figures 5 and 6; and
    Figure 8 depicts a variety of aperture plates according to the invention;
    Figure 9 depicts the intensity distribution for the aperture plate depicted in Figure 8b;
    Figure 10 is a graph showing the focus signal for a biconfocal sensor with aperture plates shown in Figure 8b;
    Figure 11 depicts an optimal focus signal; and Figure 12 depicts cross-sections of aperture plates.
    DETAILED DESCRIPTION
    Figure 1 schematically depicts a lithographic apparatus. The apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g., UV radiation or DUV radiation). a support structure (e.g., a mask table) MT constructed to support a patterning device (e.g., a mask) MA and connected to a first positioner PM configured to accurately position the patterning device in accordance with certain parameters; a substrate table (e.g., a wafer table) WT constructed to hold a substrate (e.g., a resist-coated wafer) W and connected to a second positioner PW configured to accurately position the substrate in accordance with certain parameters; and a projection system (e.g. a refractive projection lens system) PL configured to project a pattern beamed to the radiation beam B by patterning device MA onto a target portion C (e.g. including one or more dies) of the substrate W.
    The illumination system may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic or other types of optical components, or any combination thereof, for directing, shaping, or controlling radiation.
    The support structure supports, i.e. bears the weight of, the patterning device. It holds the patterning device in a manner that depends on the orientation of the patterning device, the design of the lithographic apparatus, and other conditions, such as for example whether or not the patterning device is a hero in a vacuum environment. The support structure can use mechanical, vacuum, electrostatic or other clamping techniques to hold the patterning device.
    The support structure may be a frame or a table, for example, which may be fixed or movable as required. The support structure may ensure that the patterning device is at a desired position, for example with respect to the projection system. Any use of the terms "reticle" or "mask" may be considered synonymous with the more general term "patterning device." The term "patterning device" used should be broadly interpreted as referring to any device that can be used to impart a radiation beam with a pattern in its cross-section such as to create a pattern in a target portion of the substrate . It should be noted that the pattern imparted to the radiation beam may not exactly correspond to the desired pattern in the target portion of the substrate, for example if the pattern includes phase-shifting features or so called assist features. Generally, the pattern imparted to the radiation beam will correspond to a particular functional layer in a device being created in the target portion, such as an integrated circuit.
    The patterning device may be transmissive or reflective. Examples of patterning devices include masks, programmable mirror arrays, and programmable LCD panels. Masks are well known in lithography, and include mask types such as binary, alternating phase shift, and attenuated phase shift, as well as various hybrid mask types. An example of a programmable mirror array employs a matrix arrangement of small mirrors, each of which can be individually tilted so as to reflect an incoming radiation beam in different directions. The tilted mirrors impart a pattern in a radiation beam, which is reflected by the mirror matrix. 100017] The term "projection system" used should be broadly interpreted as encompassing any type of projection system, including refractive, reflective, catadioptric, magnetic, electromagnetic and electrostatic optical systems, or any combination thereof, as appropriate for the radiation exposure being used , or for other Factors such as the use of an immersion liquid or the use of a vacuum. Any use of the term "projection lens" may also be considered as synonymous with the more general term "projection system".
    As pictured here, the apparatus is of a transmissive type (e.g., employing a transmissive mask). Alternatively, the apparatus may be of a reflective type (e.g., employing a programmable mirror array or a type referred to above, or employing a reflective mask).
    The lithographic apparatus may be of a type having two (dual stage) or more substrate tables (and / or two or more mask tables). In such "multiple stage" machines the additional tables may be used in parallel, or preparatory steps may be carried out on one or more tables while one or more other tables are being used for exposure.
    The lithographic apparatus may also be a type of at least a portion of the substrate may be covered by a liquid having a relatively high refractive index, e.g., water, so-to-fill space between the projection system and the substrate. Liquid immersion may also be applied to other spaces in the lithographic apparatus, for example, between the mask and the projection system. Immersion techniques are well known in the art for increasing the numerical aperture of projection systems. The term "immersion" as used does not mean that a structure, such as a substrate, must be submerged in liquid, but rather only means that liquid is located between the projection system and the substrate during exposure.
    Referring to Figure 1, the illuminator IL receives a radiation beam from a radiation source SO. The source and the lithographic apparatus may be separate entities, for example when the source is an excimer laser. In such cases, the source is not considered to be a part of the lithographic apparatus and the radiation beam is passed from the source SO to the illuminator 1L with the aid of a beam delivery system BD including, for example, suitable directing mirrors and / or a beam expander. In other cases the source may be an integral part of the lithographic apparatus, for example when the source is a mercury lamp. The source SO and the illuminator IL, together with the beam delivery system BD if required, may be referred to as a radiation system.
    [000221 The illuminator IL may include an adjuster AD for adjusting the angular intensity distribution of the radiation beam. Generally, at least the outer and / or inner radial extent (commonly referred to as σ-outer and σ-inner, respectively) or the intensity distribution in a pupil plane or the illuminator can be adjusted. In addition, the illuminator IL may include various other components, such as an integrator IN and a condenser CO. The illuminator may be used to condition the radiation beam, to have a desired uniformity and intensity distribution in its cross-section.
    The radiation beam B is incident on the patterning device (e.g., mask MA), which is a hero on the support structure (e.g., mask table MT), and is patterned by the patterning device. Having traversed the mask MA, the radiation beam B passes through the projection system PL, which beam the beam onto a target portion C or the substrate W. With the aid of the second positioner PW and position sensor IF (eg an interferometric device, linear encoder, 2-D encoder or capacitive sensor), the substrate table WT can be moved accurately, eg so as to position different target portions C in the path of the radiation beam B. Similarly, the first positioner PM and another position sensor (which is not explicitly depicted in Figure 1) can be used to accurately position the mask MA with respect to the path of the radiation beam B, eg after mechanical retrieval from a mask library, or during a scan. In general, movement of the mask table MT may be realized with the aid of a long-stroke module (coarse positioning) and a short-stroke module (fine positioning), which form part of the first positioner PM. Similarly, movement of the substrate table WT may be realized using a long-stroke module and a short-stroke module, which form part of the second positioner PW. In the case of a stepper (as opposed to a scanner) the mask table MT may be connected to a short-stroke actuator only, or may be fixed. Mask MA and substrate May be aligned using mask alignment marks M1, M2 and substrate alignment marks P1, P2. Although the substrate alignment marks as illustrated occupy dedicated target portions, they may be located in spaces between target portions (these are known as scribe-lane alignment marks). Similarly, in situations in which more than one that is provided on the mask MA, the mask alignment marks may be located between the dies.
    The depicted apparatus could be used in at least one of the following modes: 1. In step mode, the mask table MT and the substrate table WT are kept essentially stationary, while an entire pattern imparted to the radiation beam is projected onto a target portion C at one time (ie a single static exposure). The substrate table WT is then shifted in the X and / or Y direction so that a different target portion can be exposed. In step mode, the maximum size of the exposure field limits the size of the target portion C imaged in a single static exposure. 2. In scan mode, the mask table MT and the substrate table WT are scanned synchronously while a pattern beamed to the radiation beam is projected onto a target portion C (i.e. a single dynamic exposure). The velocity and direction of the substrate table WT relative to the mask table MT may be determined by the (de-) magnification and image reversal characteristics of the projection system PL. In scan mode, the maximum size of the exposure field limits the width (in the non-scanning direction) or the target portion in a single dynamic exposure, whereas the length of the scanning motion has the height (in the scanning direction) of the target portion. 3. In another mode, the mask table MT is kept essentially stationary holding a programmable patterning device, and the substrate table WT is moved or scanned while a pattern is imparted to the radiation beam is projected onto a target portion C. In this mode, generally a pulsed radiation source is employed and the programmable patterning device is updated as required after each movement of the substrate table WT or in between successive radiation pulses during a scan. This mode of operation can be readily applied to maskless lithography that utilizes programmable patterning device, such as a programmable mirror array or a type as referred to above.
    [00025 | Combinations and / or variations on the modes described above or use or entirely different modes or use may also be employed.
    As shown in Figure 2, the lithographic apparatus LA forms part of a lithographic cell LC, also sometimes referred to a lithocell or cluster, which also includes apparatus for perform pre-and post-exposure processes on a substrate. Conventionally these include spin coaters SC to deposit resist layers, developers DE to develop exposed resist, chill plates CH and bake plates BK. A substrate handler, or robot, RO picks up substrates from input / output ports I / Ol, 1/02, moves them between the different process apparatus and delivers then to the loading bay LB of the lithographic apparatus. These devices, which are often collectively referred to as the track, are under the control of a track control unit TCU which is itself controlled by the supervisory control system SCS, which also controls the lithographic apparatus via the LACU lithography control unit. Thus, the different apparatus can be operated to maximize throughput and processing efficiency.
    In order that the substrates that are exposed by the lithographic apparatus are exposed correctly and consistently, it is desirable to inspect exposed substrates to measure properties such as overlay errors between subsequent layers, line thicknesses, critical dimensions (CD), etc. If errors are detected, adjustments may be made to exposures or subsequent substrates, especially if the inspection can be done soon and fast enough that other substrates or the same batch are still exposed. Also, already exposed substrates may be stripped and reworked - to improve yield - or discarded - otherwise avoiding performing exposures on substrates that are known to be faulty. In a case where only some target portions or a substrate are faulty, further exposures can be performed only on those target portions which are good.
    An inspection apparatus is used to determine the properties of the substrates, and in particular, how the properties of different substrates or different layers of the same substrate vary from layer to layer. The inspection apparatus may be integrated into the lithographic apparatus LA or the lithocell LC or may be a stand-alone device. To enable most rapid measurements, it is desirable that the inspection apparatus measure properties in the exposed resist layer immediately after the exposure. However, the latent image in the resist has a very low contrast - there is only a very small difference in refractive index between the parts of the resist which have been exposed to radiation and those which have not - and not all inspection apparatus have sufficient sensitivity to make useful measurements of the latent image. Therefore measurements may be tasks after the post-exposure bake step (PEB) which is customarily the first step carried out on exposed substrates and increases the contrast between exposed and unexposed parts of the resist. At this stage, the image in the resist may be referred to as semi-latent. It is also possible to make measurements of the developed resist image - at which point either the exposed or unexposed parts of the resist have been removed - or after a pattern transfer step such as etching. The latter possibility limits the possibilities for rework or faulty substrates but may still provide useful information.
    [00029 | Figure 3 depicts a scatterometer which may be used in the present invention. It comprises a broadband (white light) radiation projector 2 which projects radiation onto a substrate W. The reflected radiation is passed to a spectrometer detector 4, which measures a spectrum 10 (intensity as a function of wavelength) or the specular reflected radiation. From this data, the structure or profile giving rise to the detected spectrum may be reconstructed by processing unit PU, eg by Rigorous Coupled Wave Analysis and non-linear regression or by comparison with a library of simulated spectra as shown at the bottom of Figure 3 In general, for the reconstruction the general form of the structure is known and some parameters are assumed from knowledge of the process by which the structure was made, leaving only a few parameters or the structure to be determined from the scatterometry data. Such a scatterometer may be configured as a normal-incidence scatterometer or an oblique-incidence scatterometer.
    Another scatterometer that may be used with the present invention is shown in Figure 4. In this device, the radiation emitted by radiation source 2 is focused using lens system 12 through interference filter 13 and polarizer 17, reflected by partially reflected surface 16 and is focused on substrate W via a microscope objective lens 15, which has a high numerical aperture (NA), preferably at least 0.9 and more preferably at least 0.95. Immersion scatterometers may have lenses with numerical apertures over 1. The reflected radiation then transmits through partially reflective surface 16 into a detector 18 in order to have the scatter spectrum detected. The detector may be located in the back-projected pupil plane 11, which is at the focal length of the lens system 15, however the pupil plane may instead be reimaged with auxiliary optics (not shown) onto the detector. The pupil plane is the plane in which the radial position of radiation defines the angle of incidence and the angular position defines azimuth angle of the radiation. The detector is preferably a two-dimensional detector so that a two-dimensional angular scatter spectrum or a substrate target 30 can be measured. The detector 18 may be, for example, an array or CCD or CMOS sensors, and may use an integration time or, for example, 40 milliseconds per frame.
    A reference beam is often used for example to measure the intensity of the incident radiation. To do this, when the radiation beam is incident on the beam splitter 16 part of it is transmitted through the beam splitter as a reference beam towards a reference mirror 14. The reference beam is then projected onto a different part of the same detector 18.
    A set of interference filters 13 is available to select a wavelength of interest in the range or, say, 405 - 790 nm or even lower, such as 200 - 300 nm. The interference filter may be tunable rather than including a set of different filters. A grating could be used instead of interference filters.
    The detector 18 may measure the intensity of scattered light at a single wavelength range, or the intensity separately at multiple wavelengths or integrated over a wavelength range. Furthermore, the detector may separately measure the intensity of transverse magnetic and transverse electric-polarized light and / or the phase difference between the transverse magnetic and transverse electric-polarized light.
    Using a broadband light source (i.e., one with a wide range of light frequencies or wavelengths - and therefore of colors) is possible, which gives a large etendue, allowing the mixing or multiple wavelengths. The variety of wavelengths in the broadband preferably each has a bandwidth or Δλ and a spacing or at least 2 Δλ (i.e. twice the bandwidth). Several "sources" or radiation can be different portions or an extended radiation source which have been split using fiber bundles. In this way, angle resolved scatter spectra can be measured at multiple wavelengths in parallel. A 3-D spectrum (wavelength and two different angles) can be measured, which contains more information than a 2-D spectrum. This allows more information to be measured which increases metrology process robustness. This is described in more detail in EP1,628,164A. (00035] The target 30 on substrate May be a grating, which is printed such that after development, the bars are formed or solid resist lines. The bars may alternatively be etched into the substrate. This pattern is sensitive to chromatic aberrations in the lithographic projection apparatus, particularly the projection system PL, and illumination symmetry and the presence of such aberrations will manifest themselves in a variation in the printed grating., the scatterometry data of the printed gratings is used to reconstruct the gratings. grating, such as line widths and shapes, may be input to the reconstruction process, performed by processing unit PU, from knowledge of the printing step and / or other scatterometry processes. 100036] Figure 5 depicts a biconfocal sensor with a first aperture plate 21 located in a first branch of the biconfocal sensor and behind the focal point of the sensor, and a second aperture plate 22 located in a second branch of the biconfocal sensor and in front of the focal point of the sensor. Behind the first aperture plate is located a first detector 23 and behind the second aperture plate is a second detector 24 (in this embodiment also in front of the focal point of the sensor). The two branches of the biconfocal sensor serve to generate two signals. Each signal is, as can be seen from Figure 7, a bell shaped curve. The difference between these two signals is the focus error, which is shown as the solid line in Figure 7. This is a roughly linear slope through the focal point and tails as the signal becomes progressively defocused. Although this is intended to be an illustrative confocal sensor, the invention is not limited to this particular biconfocal arrangement and indeed the invention can be used in conjunction with any confocal focus sensor. (00037] The invention relates in particular to the aperture plates 21 and 22. Aperture plates according to the invention include a central aperture 31 and outer aperture portions 32,33,34,35. outer aperture portions 33 serve to broaden the bell curve and a bell curve for the aperture shown in Figure 8b is shown as curve 90 in Figure 9. For comparison a bell curve for a typical pinhole aperture shape is shown in dotted curve 91. The outer aperture portions may include circular outer apertures 33, as shown in Figure 8b, triangular shaped apertures 32 as shown in Figure 8a, slit shaped 34 apertures as shown in Figure 8c or indeed any other shape of aperture. to the outer aperture portions pictured here and could include, for example, annulus shaped aperture portions However, the aperture plates 21 and 22 should preferably be rotationally symmetric and preferably four or more fold rotatio nally symmetric.
    The central aperture 31 depicted here is circular, as this gives the highest degree of rotational symmetry. However, the central aperture need not be circular and could be any other shape, for example star shaped or square.
    The outer aperture portions 33 may be separate and distinct from the central aperture 31 as shown in Figure 8b. Alternatively, the outer aperture portions 32 could be contiguous with the central aperture 31, as shown in Figure 8a. Furthermore a combination of some distinct outer aperture portions 34 and some outer aperture portions 35 which are contiguous with the centers! aperture 31 is also possible, as shown in Figure 8c. To prevent erroneous readings the area or the outer aperture portions should not be larger than the area or the central aperture.
    Although the invention has been described using aperture plates with transmissive portions and opaque portions may also be used.
    FIG. 10 shows a focus error signal si, a focus signal $ 2 and a signal sl / s2 resulting from a confocal sensor using aperture plates depicted in Figure 8b. This results in a larger capture range and the focus signal for defocused substrates being larger. Furthermore, the slope of the focus signal around the focal point has been maintained.
    The optimum focus signal would be linear with the line represented by x = y through zero but be within a limited range. Figure 11 shows a first and second optimal focus signal Sol and So2. To obtain a similar signal before and after the focal point must be different and this can be achieved by the slits, or apertures having a tilt (i.e. not having a uniform cross section along the path of the radiation beam). Figure 12 depicts cross-sections or aperture plates 21.22 in which the apertures do not have a uniform cross-section. In Figure 12a a cross section of an aperture plate depicts 21.22 the focal point is behind the aperture plate whereas in Figure 12b a cross section of an aperture plate 21.22 in which the focal point is in front of the aperture plate.
    Although specific reference may be made in this text to the use of lithographic apparatus in the manufacture of ICs, it should be understood that the lithographic apparatus described may have other applications, such as the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquid-crystal displays (LCDs), thin film magnetic heads, etc .. The skilled artisan will appreciate that, in the context of such alternative applications, any use of the terms "wafer "or" die "Read may be considered as synonymous with the more general terms" substrate "or" target portion ", respectively. The substrate referred to may be processed, before or after exposure, in for example a track (a tool that typically applies to a layer of resist to a substrate and develops the exposed resist), a metrology tool and / or an inspection tool. Where applicable, the disclosure may be applied to such and other substrate processing tools. Further, the substrate may be processed more than once, for example in order to create a multi-layer IC, so the term substrate used may also refer to a substrate that already contains multiple processed layers. 100043] Although specific reference may have been made above to the use of the invention in the context of optical lithography, it will be appreciated that the invention may be used in other applications, for example imprint lithography, and where the context allows, is not limited to optical lithography. In imprint lithography a topography in a patterning device the pattern created on a substrate. The topography of the patterning device may be pressed into a layer or resist supplied to the substrate whereupon the resist is cured by applying electromagnetic radiation, heat, pressure or a combination thereof. The patterning device is moved out of the resist leaving a pattern in it after the resist is cured. (00044] The terms "radiation" and "beam" used include compass and all types of electromagnetic radiation, including ultraviolet (UV) radiation (eg having a wavelength of or about 365, 355, 248, 193,157 or 126 nm) and extreme ultra- violet (EUV) radiation (eg having a wavelength in the range of 5-20 nm), as well as particle beams, such as ion beams or electron beams.
    The term "lens", where the context allows, may refer to any one or combination of various types of optical components, including refractive, reflective, magnetic, electromagnetic and electrostatic optical components. 100046] While specific have the invention described above, it will be appreciated that the invention may be practiced otherwise than as described. For example, the invention may take the form of a computer program containing one or more sequences of machine-readable instructions describing a method as disclosed above, or a data storage medium (eg semiconductor memory, magnetic or optical disk) having such a computer program stored therein.
    The descriptions above are intended to be illustrative, not limiting. Thus, it will be apparent to one skilled in the art that modifications may be made to the invention as described without departing from the scope or the clausess set out below. Other aspects of the invention are set out as in the following numered clauses: 1. A focus sensor including a confocal sensor including a variety of plates, each plate including a central transmissive portion and an outer transmissive portion, the remainder of said plates being opaque . 2. A focus sensor according to clauses 1 said said plates are aperture plates, each aperture plate including a central aperture and a various or outer aperture portions. 3. A focus sensor according to clauses 1 there are various or outer transmissive portions. 4 A focus sensor according to clauses 1 said central transmissive portion comprises a circular transmissive portion. 5 A focus sensor according to clauses 1 said plates have rotational symmetry about the optical axis or the focus sensor. 6 A focus sensor according to clauses 3 said plates have four fold rotational symmetry about the optical axis or the focus sensor. 7 A focus sensor according to clauses 3 wherever said various or outer transmissive portions comprise a various or circular transmissive portions. 8 A focus sensor according to clauses 3wherein said outer transmissive portions are continguous with said central transmissive portions. 9 A focus sensor according to clauses 1 said said confocal sensor comprises detectors arranged behind said plates. 10. A focus sensor according to clauses 1 there is a first plate and a second plate, said first and second plates being identical. 11 A focus sensor according to clauses 1 according to a first plate is arranged in a first branch or said confocal sensor and a second plate is arranged in a second branch or said confocal sensor. 12 A focus sensor according to clauses 1 said said first plate is arranged behind a focal point or said confocal sensor and said second plate is arranged in front of a focal point or said confocal sensor. 13 A focus sensor according to clauses 1 said said central transmissive portion does not have a uniform cross-section. 14 A focus sensor according to clauses 1 said said outer transmissive portion does not have a uniform cross-section. 14. An inspection apparatus configured to measure a property of a substrate, including: an illumination system configured to condition a radiation beam; a radiation projector configured to project a radiation onto said substrate; a high numerical aperture lens; a detector configured to detect the radiation beam reflected from a surface of the substrate; and a focus sensor including a confocal sensor including a variety of plates, each plate including a central transmissive portion and an outer transmissive portion, the remainder of said plates being opaque. 15. A lithographic apparatus including an illumination optical system arranged to illuminate a pattern; a projection optical system arranged to project an image of the pattern on a substrate; and a focus sensor including a confocal sensor including a variety of plates, each plate including a central transmissive portion and an outer transmissive portion, the remainder of said plates being opaque. 16. A control system for controlling the position of a substrate, the system including: a focus sensor including a confocal sensor including a variety of plates, each plate including a central transmissive portion and an outer transmissive portion, the remainder of said plates being opaque a controller for controlling the position of said substrate.
    权利要求:
    Claims (1)
    [1]
    I. A lithography apparatus comprising; an illumination device adapted to provide a radiation beam; a carrier constructed to support a patterning device, the patterning device being capable of applying a pattern in a section of the radiation beam to form a patterned radiation beam; a substrate table constructed to support a substrate; and a projection device adapted to project the patterned radiation beam onto a target area of the substrate, characterized in that the substrate table is adapted to position the target area of the substrate in a focal plane of the projection device.
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    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
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    法律状态:
    2009-12-01| AD1A| A request for search or an international type search has been filed|
    优先权:
    申请号 | 申请日 | 专利标题
    US7112508P| true| 2008-04-14|2008-04-14|
    US7112508|2008-04-14|
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